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ArF photoresist products passed customer certification Hay:I03JSND

On December 17, China's leading lithography machine technology company, JSND Optoelectronic Materials Technology Group, issued an announcement that the ArF photoresist product independently developed by the company's holding subsidiary NBND Optoelectronic Materials Co., Ltd. has recently successfully passed customer certification.

"ArF photoresist product development and industrialization" is a key research project of JSND undertaking the national "02 special project". The passing of the product certification marks a key breakthrough in the "ArF photoresist product development and industrialization" project, becoming the first domestic ArF photoresist to pass product verification in China, laying a foundation for the full completion of the project goal solid foundation.

The certification evaluation report shows that “this certification selects the customer's control gate in 50nm flash memory products for verification. The performance of JSND's ArF photoresist products meets the process specifications and the yield results meet the standards.”

ArF photoresist material is an important key material in the field of integrated circuit manufacturing, and can be used in the integrated circuit manufacturing process of 90nm-14nm or even 7nm technology nodes. It is widely used in high-end chip manufacturing (such as logic chips, AI chips, 5G chips, mass storage and cloud computing chips, etc.).

The market prospect of ArF photoresist is better than expected. With the rapid development of the domestic IC industry, the acceleration of independent innovation and localization, and the application of advanced process technology, the amount of photoresist will greatly increase.

The industrialization of the client certification is of great significance. The 50nm flash memory technology platform used in this verification, in terms of feature size, the wire process process can meet the needs of 45nm-90nm lithography, and the hole process process can meet the needs of 65nm-90nm lithography. The photoresist of this process platform is representative in the industry.

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