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China high-purity thin-film materials: Sputtering target materials, evaporation material manufacturer build new sputtering target: high-purity copper targets, aluminum scandium targets and molybdenum target projects Hay:A01FJAS

On June 29, 2020, China high-purity thin-film materials: Sputtering target materials, evaporation material manufacturer FJAS Electronic Materials Technology Group issued an announcement:

The company will invest no more than RMB 600 million in flat-screen display sputtering target construction projects, ultra-high-definition display copper target industrialization construction projects, aluminum scandium target and molybdenum target development and construction projects.

After the project is completed, it will have an annual production capacity of 800 tons of copper targets, molybdenum targets, 350 tons of aluminum scandium targets, and 50 tons of silicon targets.

For the ultra-high-definition display copper target industrialization construction project, the investment mainly includes construction engineering costs, equipment purchase and installation costs, other engineering construction costs, and bottoming working capital. The total investment of the project is 244 million yuan, and the project construction period is 2 years.

Aluminum scandium target and molybdenum target project investment mainly includes equipment purchase and installation costs, research and development costs, basic preparation costs, etc. The total investment of the project is 121 million yuan.

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