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China leading ultra-large-size high-precision photomask manufacturer/maker to build 6 high-generation photomask production lines Hay:I03SZLW

At 11:00 on June 27, 2019, the opening ceremony of the SZLW Optoelectronics Industrial Park was solemnly held. The shareholders of SZLW Optoelectronics Technology Group, representatives of the planners and builders of the park, and all employees of Chengdu Luwei attended the ceremony to witness the opening of the Luwei Optoelectronics Industrial Park.

At the opening ceremony, Mr. Du Wubing, Chairman and General Manager of SZLW Optoelectronics Technology Group, expressed his sincere gratitude to the shareholders for their support and trust on behalf of Luwei, and sincerely expressed their gratitude to those who have participated in the construction of the park and worked hard for Luwei. gratitude!

As a global leader in high-generation, ultra-large-scale high-precision photomask versions, SZLW Optoelectronics Technology Group invested in an optoelectronic industrial park covering an area of over 36,000 square meters. It plans to build 6 high-generation mask production lines in two phases to build domestic The largest photomask production base.

The SZLW Optoelectronic Industrial Park is completed and put into use, which will greatly enhance the company's overall strength and lay a solid foundation for becoming a world-class enterprise in the mask version industry!

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