Present an oligopoly pattern
At present, the global target manufacturing industry, especially the high-purity target market, presents an oligopolistic pattern, which is mainly controlled by several large US and Japanese companies, such as Japan ’s Mitsui Mining, Nippon Mining Metals, Japan Tosoh, Sumitomo Chemical, Japan's AFA, as well as Honeywell and Praxair in the United States. Relevant data shows that Japan Mining Metals is the world's largest target supplier, with target sales accounting for about 30% of the global market. Honeywell accounted for after acquiring Johnson Mattey, integrating high-purity aluminum, titanium and other raw material production plants. To 20% of the global market share, in addition, Tosoh and Praxair accounted for 20% and 10%, respectively. After grasping the core technology of sputtering target production, these companies implement extremely strict confidentiality measures to limit the diffusion of technology, and at the same time continue to expand horizontally and vertically, and actively expand their business reach to various application areas of sputtering coating, firmly Grasp the initiative of the global sputtering target market and lead the technological progress of the global sputtering target industry.
Chinese companies are emerging and have a promising future
At present, Chinese high-purity metal sputtering target manufacturers have developed, and high-end high-purity metal sputtering target manufacturers represented by NBSF, BJYY and other companies have fully participated in the international market in the semiconductor, flat panel display and solar cell markets. competition.
Relying on China's huge domestic market potential and favorable industrial policies, as well as product price advantages, they have increased their market share in the domestic market year by year, and gradually seized the market space of some major international manufacturers in individual segments. In recent years, the Chinese government has formulated a series of industrial policies, such as the 863 Program and the 02 Special Fund, to accelerate the localization of the supply of sputtering targets, and promote domestic targets to achieve a leap from scratch in multiple application fields. These all support and promote the development of the sputtering target industry from the height of the national strategy.