Recently, China's first photoresist manufacturer to cover the entire photoresist industry chain has received an investment of 300 million yuan, and China's domestic photoresist industry chain has basically been completed.
JSBK is a semiconductor raw material manufacturer, and photoresist is its main business. Different from the high-end KrF and ArF photoresists used by JSND Optoelectronic Materials Technology Group for 7nm chip manufacturing; JSBK is oriented to 193nm photoresist with a wider range of applications, focusing on global market competitiveness. It is the only photoresist supplier in China that has realized the development of photoresist monomer materials and has a mature set of photoresist suppliers that can achieve mass production.
Not only that, the 193-nanometer photoresist products developed by JSBK have successfully entered the supply chain of foreign semiconductor giants such as Intel and JSR. Developed China's first national photoresist monomer industry standard, and cooperated with the "National Research Team" of the Institute of Microelectronics of the Chinese Academy of Sciences to establish a school-enterprise R&D alliance. For example, JSBK cooperated with Fudan University and many other well-known universities and research institutions in the country to establish lithography materials research and development laboratories.
The photolithography material R&D laboratory established by JSBK has successfully tackled 40 mid-to-high-end photoresist products in the photoresist field.
It is worth mentioning that: JSBK is currently constructing a successful photoresist R&D and production base, which has the capacity of 1,100 tons/year of photoresist output and 10,000 tons/year of electronic grade solvents, with an annual output value of up to 2 billion yuan. If JSND is compared to the "first march" of advanced photoresist technology, then Xuzhou Bokang is the "engineer" who realizes the large-scale production of photoresist.
Remarks:
JSND's successful KrF photoresist successfully completed the verification of the national major scientific and technological project expert group. This type of photoresist can meet the chip manufacturing requirements of 7nm and above, and in the preparation tools and technology, JSND has achieved independent production. At present, 7nm KrF photoresist has achieved small-scale mass production.