On May 24, 2021, China's leading CMP polishing liquid manufacturer: SHAJ Microelectronics Technology Corporation issued an announcement saying:
The company has formed seven product platforms: copper and copper barrier layer polishing liquid, dielectric material polishing liquid, tungsten polishing liquid, polishing liquid based on cerium oxide abrasive, substrate polishing liquid, functional wet electronic chemicals and new materials and new processes. , and have achieved different degrees of progress and breakthroughs.
Among them, the aluminum polishing liquid used in the HKMG process of the 28nm technology node has made a major breakthrough. Through customer verification, it has broken the monopoly of foreign manufacturers in this application and achieved mass production, marking the company's technical research level and further improving the company's Polishing liquid category.
SHAJ's main business is the research and development and industrialization of key semiconductor materials. Its current products include different series of chemical mechanical polishing fluids and functional wet electronic chemicals, which are mainly used in integrated circuit manufacturing and advanced packaging.
The company successfully broke the monopoly of foreign manufacturers on chemical mechanical polishing fluids and some functional wet electronic chemicals in the field of integrated circuits, realized import substitution, and enabled China to have independent supply capabilities in this field.
SHAJ's chemical mechanical polishing liquid and functional wet electronic chemical products have been successfully applied to logic chips, memory chips, analog chips, power devices, sensors, third-generation semiconductors and other special process chips, and have entered the semiconductor industry leading customers. The ranks of mainstream suppliers. According to TECHET's report, the company's CMP polishing solution has a global market share of about 5%.