SCSG Optical Technology Corporation is committed to the research and development and production of high-end synthetic quartz glass.
The company has undertaken more than 20 national, provincial, and municipal scientific research projects, with key technical indicators at a leading level in China and reaching international advanced levels.
SCSG optical products are widely used in aerospace, precision optics, lithography technology, semiconductors and other application fields, and are the main supplier of high-end synthetic fused quartz glass in China.
In recent years, the company has developed photomask substrate products for TFT and chips, achieving significant progress and iconic results. It has successfully developed multiple advanced process semiconductor photomask products, and all technical indicators have met customer standards, achieving successful batch application of the products.
High purity ultraviolet fused quartz glass
High purity ultraviolet fused quartz glass can be applied in fields such as precision optics, lithography technology, and semiconductor manufacturing.
The high-quality ultraviolet fused quartz glass developed by the company using direct synthesis method has excellent optical properties such as large size, good axial symmetry, high purity, high transmittance, good uniformity, low stress, no stripes, no bubbles, no fluorescence, and resistance to laser damage.
The optical uniformity of high-purity ultraviolet fused quartz glass reaches 4 × The ratio between 10 and 6 has reached over 90%, and the technological maturity has significantly improved. It is the main supplier of high-end synthetic fused quartz glass in China. The highlights and characteristics of this product are as follows:
.China's first vertical single lamp deposition process device, integrating three major modules: raw material pretreatment, reaction synthesis, and growth;
.Accurate combustion control and high purity technology for liquid evaporation flow field;
.Excellent burner thermal field matching axial consistent deposition automatic control technology;
.Precision slot sinking hot forming defect lateral suppression technology, breaking through the bottleneck of large-scale quartz glass production;
.Multi stage precision annealing technology for stress relief;
.Key indicator: Optical uniformity breakthrough 8 × 10-7 is currently the only enterprise in China that meets this indicator, and is at a leading domestic and international level.
High purity ultraviolet fused quartz glass products
Diameter or diagonal ≥ 550mm, light absorption coefficient ≤ 2 × 10-5. Optical Uniformity 4 × 10-6. Impurity content ≤ 590ppb, stress ≤ 5nm/cm, stripe degree level 0, resistant to UV laser irradiation.
Universal response to the material index system of foreign brands. The lighting system, objective system, and advanced process semiconductor photomask substrate used in KrF excimer laser lithography systems in national major optical engineering and semiconductor industry have achieved domestic matching of key components in the field of intense laser and semiconductor industry, driving and promoting industry import substitution, Listed in the "Guiding Catalogue for the First Batch Application of Key New Materials (2019 Edition)" No. 160 by the Ministry of Industry and Information Technology of China.
High purity ultraviolet fused quartz glass is widely used in scientific research institutes (Laser Fusion Research Center of the Chinese Academy of Physics, Institute of Microelectronics of the Chinese Academy of Sciences, Institute of Optoelectronics of the Chinese Academy of Sciences), precision optics clients (Nanjing Wavelength Optoelectronics Technology), semiconductor downstream clients (Changsha Shaoguang Core Materials Technology, Shanghai Chuanxin Semiconductor, Chengdu Zhongke Zhuoer Technology) Downstream customers of mask (Hunan Puzhao Information Materials, Anhui Hecheng New Materials, Shanghai Zhizhen Industry, Shenzhen Jingshi Photomask Technology).