Accelerate the application of nanoimprint lithography in the field of optoelectronic manufacturing
Promotion and technical collaboration between two market leaders to combine their strengths to provide nanoimprint lithography development kits and enable high-volume production
September 20, 2022 Toppan Photomask Co. Ltd., the world's premier photomask supplier, and EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today Announced that the two companies have reached an agreement to jointly promote nanoimprint lithography (NIL), a high-volume manufacturing (HVM) process that enables the optoelectronics industry.
Combining the strengths of a leading supplier and pioneer of NIL systems with a leading supplier of photomasks to the semiconductor market, this collaboration aims to establish NIL as the industry standard production process for optoelectronic manufacturing and to accelerate its implementation in HVM to support various kinds of applications. These applications include augmented/mixed/virtual reality headsets, smartphones, automotive sensors, and medical imaging systems.
Photomasks for semiconductors manufactured by Toppan Photomask, Nano Imprint Lithography (NIL) masters are fabricated using the same materials, techniques and processes
At EV Group's NILPhotonics Competence Center, process engineers inspect a 200mm wafer on which metalens were replicated using a master produced by Toppan Photomask and EVG's Nanoimprint Lithography (NIL) process.
As part of this non-exclusive collaboration, EVG and Toppan Photomask will combine their respective knowledge, expertise and services to provide NIL development kits to further promote NIL using master templates provided by Toppan Photomask and equipment and process development services provided by EVG technology and improve the possibility of applying this technology to industrial production. EVG will also provide NIL technology and product demonstrations to interested companies at its EVG NILPhotonics Competence Center at its Austrian headquarters. In addition, both companies have designated the other as a preferred recommended supply chain partner for companies interested in using NIL technology in their production processes.
Chan-Uk Jeon, Chief Technology Officer, Toppan Photomask Co. Ltd. said: "Toppan Photomask is very excited to partner with EVG. EVG's NIL tooling and processing capabilities are world-class and will improve the adoption of optoelectronic technology and other New technology cost-effectiveness of NIL technology. Toppan Photomask believes that driven by the significant advantages of both companies, NIL technology has good prospects and promises to be another successful lithography solution.”
Achieving Nanoimprint Lithography as Mainstream Manufacturing Technology
Conventional lithography has reached its limits for future applications in creating fine patterns of arbitrary shape, such as metalens. NIL is a well-established and cost-effective process for generating nanometer-resolution patterns on complex structures, and is therefore a viable alternative for these applications. NIL can replicate these complex structures very efficiently in large areas with fewer design constraints and a very streamlined process flow, making it ideal for prototyping and HVM.
EVG has been a pioneer in NIL technology for over 20 years, through partnerships with optical materials (such as adhesives and resists), substrate materials and stamp production suppliers, as well as optical components and equipment manufacturers throughout the NIL supply chain. cooperation with enterprises to contribute to the creation of a broader NIL ecosystem. EVG and Toppan Photomask, well-known industry leaders in lithography and photomask manufacturing, respectively, have partnered to promote NIL as a mainstream HVM technology for the optoelectronics industry.
Markus Wimplinger, Director of Corporate Technology Development and Intellectual Property at EV Group, said: "We are delighted to partner with Toppan Photomask to bring nanoimprint lithography to mainstream manufacturing applications. As a leading semiconductor photomask supplier known for the highest quality standards, Toppan Photomask has extensive experience in using standardized production methods that meet the most stringent production requirements worldwide. This is the first collaboration between a nanoimprint process equipment and service provider and a nanoimprint master producer, and a great opportunity for the industry A huge win, we will work together to help our customers rapidly scale up NIL applications as a mass production technology for advanced optical devices and components, helping them bring new 'virtual' ideas to life."
Upcoming Nanoimprint Industry Events
Experts from both companies will discuss the collaboration at the Micro and Nano Engineering (MNE) Eurosensors 2022 Conference to be held from September 19 to 23 at the Gasthuisberg Academic Campus in Leuven, Belgium. Attendees can visit EVG's booth S8 for more information.
In addition, EVG's Christine Thanner will be presenting at the Nanoimprinting and Nanoprinting Technology (NNT) Conference in Toyama, Japan on October 5th, and will present in the plenary session entitled "Nanoimprinting – From Niche to Mass Production ”, where she will address the importance of a matching combination of NIL mastering techniques, replication equipment and processes.