The reporter learned from the Kunming Institute of Precious Metals that the research and development team of the Yunnan Key Laboratory of Precious Metal Materials under the institute has recently made major breakthroughs in the key preparation technology and engineering application research of rare and precious metal sputtering targets for the electronic information industry. Developed a series of rare and precious metal sputtering targets.
Series of rare and precious metal sputtering targets break foreign monopoly
It is understood that thin and precious metal films are strategic materials that play a core supporting role in the electronic information industry, and sputtering targets are the key material source for the preparation of films. Previously, the preparation of high-end rare and precious metal targets was mainly concentrated in Japan, the United States, Germany and other countries.
Led by the director of the laboratory, Hu Changyi, the research team aimed at the situation of rare metal sputter targets being monopolized by industrial developed countries for a long time. Using melting and plastic processing methods, platinum, nickel, cobalt, chromium, platinum and boron targets were prepared, and powder metallurgy was used. Ruthenium and cobalt-chromium-platinum silicon dioxide targets have been prepared; platinum-nickel target microstructure preferred orientation control technology, high-purity ruthenium target batch preparation technology, brittle target component control and defect control technology, and oxide-containing target materials have also been developed. Phase interface combined with control technology.
High-purity precious metal platinum-nickel target and target production
Through research and application of new technologies, this team has achieved the main performance indicators of target products. The target material purity percentage is greater than or equal to 99.995, the target main component mass percentage deviation is within plus or minus 0.5, the target density is greater than or equal to 98.5%, and the target and The backplane welding rate is 98.5% or more. This series of research and development results has broken foreign monopolies, realized that similar products can replace imports, and exported to well-known American semiconductor companies.
During the research and development process, they also applied for 25 patents, authorized 11 patents, formulated 1 industry standard, and published 66 papers. The project "Key Technology and Product Development for Short-Process Preparation of High-Performance and Difficult-to-Process Rare and Precious Metal Materials" was recently awarded China in 2018 First prize for scientific and technological progress of non-ferrous metal industry.